以全像微影法製作一維週期性結構

Abstract

本論文主要是研究利用兩道等強度雷射光束(351nm)相干產生干涉場，並對塗佈在玻璃基版上的SU8負光阻劑曝光，製作一維週期性光柵結構，並調整製作過程中的曝光劑量與曝後熱烤時間，探討對光柵結構深度與表面分佈情況的影響，嘗試找出最適當的製作條件。另外我們量測光柵繞射效率，探討以純量繞射理論描述此光柵繞射行為的可行性。

In this thesis, we use two-beam interference to fabricate one-dimensional periodic gratings on the SU-8 negative photoresist, which is deposited by spin coating onto glass substrates. By properly adjusting the exposure energies and the post-exposure-bake time, the structure of the gratings can be modified. In addition, we also measure the diffraction efficiency, and try to explain the grating diffraction by scalar diffraction theory.