標題: | Formation and nonvolatile memory characteristics of multilayer nickel-silicide NCs embedded in nitride layer |
作者: | Chen, Wei-Ren Chang, Ting-Chang Yeh, Jui-Lung Sze, S. M. Chang, Chun-Yen 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-十一月-2008 |
摘要: | The authors provided the formation and memory effects of nonvolatile multilayer nickel-silicide nanocrystal memory in this study. This proposed structure can efficiently improve the drawbacks of current floating gate and single-layer nanocrystal memories for the next-generation nonvolatile memory application. The charge trapping layer of multilayer structure was deposited by sputtering a commixed target (Ni(0.3)Si(0.7)) in the argon and nitrogen ambiance, and then used a low temperature rapid thermal annealing to form uniform nanocrystals. Transmission electron microscope images clearly show the multilayer and single-layer nanocrystal structures embedded in SiN(x). X-ray photoelectron spectroscopy and x-ray diffraction also present the chemical states and crystallization of nanocrystals under different annealing temperature treatments. The capacitor with different memory structures was also studied and exhibited hysteresis characteristics after electrical operation. In addition, the multilayer nanocrystals revealed better charge storage ability and reliability than the single-layer nanocrystals. (C) 2008 American Institute of Physics. [DOI: 10.1063/1.3006126] |
URI: | http://dx.doi.org/10.1063/1.3006126 http://hdl.handle.net/11536/8213 |
ISSN: | 0021-8979 |
DOI: | 10.1063/1.3006126 |
期刊: | JOURNAL OF APPLIED PHYSICS |
Volume: | 104 |
Issue: | 9 |
結束頁: | |
顯示於類別: | 期刊論文 |