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dc.contributor.authorYang, Tsung-Juen_US
dc.contributor.authorWang, Niann S.en_US
dc.contributor.authorLee, L. C.en_US
dc.contributor.authorXu, Z. F.en_US
dc.contributor.authorLin, M. C.en_US
dc.date.accessioned2014-12-08T15:10:46Z-
dc.date.available2014-12-08T15:10:46Z-
dc.date.issued2008-10-16en_US
dc.identifier.issn1089-5639en_US
dc.identifier.urihttp://dx.doi.org/10.1021/jp805311uen_US
dc.identifier.urihttp://hdl.handle.net/11536/8243-
dc.description.abstractThe rate constant for the NCN + NO2 reaction has been measured by a laser photolysis/laser-induced fluorescence technique in the temperature range of 260-296 K at pressures between 100 and 500 Torr with He and N-2 as buffer gases. The NCN radical was produced from the photolysis of NCN3 at 193 nm and monitored by laser-induced fluorescence with a dye laser at 329.01 nm. The rate constant was found to increase with pressure but decrease with temperature, indicating that the reaction occurs via a long-lived intermediate stabilized by collisions with buffer gas. The reaction mechanism and rate constant are also theoretically predicted for the temperature range of 200-2000 K and the He and N-2 pressure range of 10(-4) Torr to 1000 atm based on dual-channel Rice-Ramsperger-Kassel-Marcus (RRKM) theory with the potential energy surface evaluated at the G2M//B3LYP/6-311+G(d) level. In the low-temperature range (< 700 K), the most favorable reaction is the barrierless association channel that leads to the intermediate complex (NCN-NO2). At high temperature, the direct O-abstraction reaction with a barrier of 9.8 kcal/mol becomes the dominant channel. The rate constant calculated by RRKM theory agrees reasonably well with experimental data.en_US
dc.language.isoen_USen_US
dc.titleKinetics and Mechanism of the NCN+NO2 Reaction Studied by Experiment and Theoryen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/jp805311uen_US
dc.identifier.journalJOURNAL OF PHYSICAL CHEMISTRY Aen_US
dc.citation.volume112en_US
dc.citation.issue41en_US
dc.citation.spage10185en_US
dc.citation.epage10192en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.department應用化學系分子科學碩博班zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.contributor.departmentInstitute of Molecular scienceen_US
dc.identifier.wosnumberWOS:000259943100015-
dc.citation.woscount7-
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