潔淨室內SF6氣體的擴散實驗

Abstract

本研究乃以六氟化硫（SF6）為追蹤氣體，模擬半導體製程機台維護保養時反應腔殘氣逸散，及管路內氣體洩漏時對潔淨室污染之影響，實驗區域為蝕刻與薄膜製程區以及爐管區，實驗區域內釋放SF6氣體同時搭配三台抽氣式FTIR於潔淨室內作多次不同位置量測，同時一組開放光徑式FTIR於相鄰獨立之微影區迴風前同步監測。研究結果發現，潔淨室內若有氣體洩漏，經與循環氣流混合後其稀釋倍數最少為105倍，即使微影為相對正壓與獨立循環區域，其他製程區之污染氣體仍會藉由擴散作用影響微影區，本研究結果將有助於氣體監測器之佈點以及擬定潔淨室微污染之控制策略。

Sulfur hexafluoride (SF6) of 99.9% was intentionally released as an emission source inside a manufacturing cleanroom to study the contaminating gas dispersion pattern during preventive maintenance processes. To measure the SF6 concentration profiles, three movable Fourier transform infrared spectrometers (FTIRs) were simultaneously used. In addition, to determine if cross-contamination of different working zones occurred, an open-path FTIR was also used to monitor the SF6 concentrations before the recirculation air of the fab. The results show that the dilution factor of the cleanroom circulation air is more than 105, and that cross-contamination situation occurs in some isolated areas. The data of this study are useful for a manufacturing fab to develop the airborne molecular contamination (AMC) strategies and to locate the gas sensor installation positions.