Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 吳文豪 | en_US |
| dc.contributor.author | Wu, Wen-Hao | en_US |
| dc.contributor.author | 張翼 | en_US |
| dc.contributor.author | Chang, Edward Y. | en_US |
| dc.date.accessioned | 2014-12-12T03:12:08Z | - |
| dc.date.available | 2014-12-12T03:12:08Z | - |
| dc.date.issued | 2008 | en_US |
| dc.identifier.uri | http://140.113.39.130/cdrfb3/record/nctu/#GT009475501 | en_US |
| dc.identifier.uri | http://hdl.handle.net/11536/82666 | - |
| dc.description.abstract | 氮氧化矽和非晶型碳材料層系統已經被證實是有效的硬質遮罩材料組合。這些材料層是由高成本、低產出之化學氣相層積製程所形成。本論文揭露出一種僅使用簡單之旋轉塗佈的塗層結構即可達成一可靠、低成本、高產出之製程。透過各種參數之調控,此製程顯示出抗反射之特性,因此可以省去額外之底面抗反射塗層 (BARC),使得製程簡化為僅有三層旋轉塗佈層結構。而且,在此我們比較光阻層/氮氧化矽層/旋塗碳材硬質罩幕層-系統與光阻層/旋塗矽材硬質罩幕層/旋塗碳材硬質罩幕層-系統,發現他們的效果是接近相當的。這意味光阻層/旋塗矽材硬質罩幕層/旋塗碳材硬質罩幕層-系統是一個效果相當但非常經濟之硬質遮罩取代製程。 | zh_TW |
| dc.description.abstract | Amorphous Carbon Layer (ACL) and SiON system has been proven to be a good hardmask combination. These layers are formed by a high cost, low throughput CVD process. This paper discloses a reliable, low cost, high throughput process using a simple spin on layer structure. Through manipulation of various parameters, this structure shows good anti-reflection characteristic, and as a results, additional BARC layer is eliminated and the process is simplified to a tri-layer structure. Also, PR / SiON / Carbon - Spin On Hardmask (C-SOH) system has been compared to PR / Si - Spin On Hardmask (Si-SOH) / C-SOH system and found their performances are comparable. This indicates the PR / Si-SOH / C-SOH process is an economical yet comparable substitute. | en_US |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 硬質罩幕 | zh_TW |
| dc.subject | 旋轉塗佈硬質罩幕 | zh_TW |
| dc.subject | 矽材質硬質罩幕 | zh_TW |
| dc.subject | 碳材質硬質罩幕 | zh_TW |
| dc.subject | Hardmask | en_US |
| dc.subject | Spin On Hardmask | en_US |
| dc.subject | Silicon Hardmask | en_US |
| dc.subject | Carbon Hardmask | en_US |
| dc.title | 旋轉塗佈硬質罩幕材料與製程表現之研究 | zh_TW |
| dc.title | Performance of Spin-On-Hardmask Material and Process Study | en_US |
| dc.type | Thesis | en_US |
| dc.contributor.department | 工學院半導體材料與製程設備學程 | zh_TW |
| Appears in Collections: | Thesis | |

