氣化氫氟酸在奈米金氧半電晶體之應用及其設備之開發(III)

Full metadata record

DC Field	Value	Language
dc.contributor.author	趙天生	en_US
dc.contributor.author	CHAO TIEN-SHENG	en_US
dc.date.accessioned	2014-12-13T10:28:44Z	-
dc.date.available	2014-12-13T10:28:44Z	-
dc.date.issued	2007	en_US
dc.identifier.govdoc	NSC96-2221-E009-189	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/88580	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=1471819&docId=264231	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	氣化氫氟酸在奈米金氧半電晶體之應用及其設備之開發(III)	zh_TW
dc.title	Processes and System Development of HF-Vapor for Nano MOSFETs' Application(III)	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學電子物理學系(所)	zh_TW
Appears in Collections:	Research Plans