Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 曲新生 | en_US |
| dc.contributor.author | CHU, HSIN-SEN | en_US |
| dc.date.accessioned | 2014-12-13T10:32:28Z | - |
| dc.date.available | 2014-12-13T10:32:28Z | - |
| dc.date.issued | 2000 | en_US |
| dc.identifier.govdoc | NSC89-2212-E009-039 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/91574 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=501218&docId=90364 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | BST介電薄膜 | zh_TW |
| dc.subject | 熱物理性質 | zh_TW |
| dc.subject | 快速熱回火製程 | zh_TW |
| dc.subject | 熱應力 | zh_TW |
| dc.subject | BST dielectric thin film | en_US |
| dc.subject | Thermal physical property | en_US |
| dc.subject | Rapid thermal processing (RTP) | en_US |
| dc.subject | Thermal stress | en_US |
| dc.title | 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫II：BST介電薄膜在12吋矽晶圓上快速熱回火製程中熱物理性質及熱應力之研究(I) | zh_TW |
| dc.title | Study on the Thermal Properties and Stresses of a 12-Inch Silicon Wafer with High-Dielectric BST Thin Films in Rapid Thermal Processing/Annealing (I) | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 交通大學機械工程系 | zh_TW |
| Appears in Collections: | Research Plans | |
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