| 標題: | 高科技製程排氣在真空情況下的細微粒控制技術(I) Fine Particle Control Technology in the Vacuum Exhaust Conditions of Semiconductor Manufacturing Processes(I) |
| 作者: | 蔡春進 Chuen-Jinn Tsai 國立交通大學環境工程研究所 |
| 公開日期: | 2003 |
| 官方說明文件#: | NSC92-2211-E009-016 |
| URI: | http://hdl.handle.net/11536/91810 https://www.grb.gov.tw/search/planDetail?id=819576&docId=155122 |
| Appears in Collections: | Research Plans |
- 高科技製程排氣在真空情況下的細微粒控制技術(III) / 蔡春進;Chuen-Jinn Tsai
- 高科技製程排氣在真空情況下的細微粒控制技術(II) / 蔡春進;Chuen-Jinn Tsai
- White smoke emission from a semiconductor manufacturing plant / Tsai, CJ;Miao, CC;Lu, HC
- An efficient venturi scrubber system to remove submicron particles in exhaust gas / Tsai, CJ;Lin, CH;Wang, YM;Hunag, CH;Li, SN
- Measurement of inorganic acidic gases and particles from the stack of semiconductor and optoelectronic industries / Huang, CH;Ho, YT;Tsai, CJ
- An efficient wet electrostatic precipitator for removing nanoparticles, submicron and micron-sized particles / Chen, Tzu-Ming;Tsai, Chuen-Jinn;Yan, Shaw-Yi;Li, Shou-Nan
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