Full metadata record
DC FieldValueLanguage
dc.contributor.author林鴻志en_US
dc.contributor.authorHORNG-CHIHLINen_US
dc.date.accessioned2014-12-13T10:33:47Z-
dc.date.available2014-12-13T10:33:47Z-
dc.date.issued2003en_US
dc.identifier.govdocNSC92-AT-7009-001zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/92282-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=884734&docId=169605en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.title高介電常數閘極介電層材料製備與可靠性分析zh_TW
dc.titlePreparation and Characterization of High-K Gate Dielectric Materialsen_US
dc.typePlanen_US
dc.contributor.department國立交通大學電子工程研究所zh_TW
Appears in Collections:Research Plans


Files in This Item:

  1. 92AT7009001.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.