完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 林鴻志 | en_US |
dc.contributor.author | HORNG-CHIHLIN | en_US |
dc.date.accessioned | 2014-12-13T10:33:47Z | - |
dc.date.available | 2014-12-13T10:33:47Z | - |
dc.date.issued | 2003 | en_US |
dc.identifier.govdoc | NSC92-AT-7009-001 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/92282 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=884734&docId=169605 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.title | 高介電常數閘極介電層材料製備與可靠性分析 | zh_TW |
dc.title | Preparation and Characterization of High-K Gate Dielectric Materials | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 國立交通大學電子工程研究所 | zh_TW |
顯示於類別: | 研究計畫 |