電漿蝕刻製程的先進製程控制

Full metadata record

DC Field	Value	Language
dc.contributor.author	林家瑞	en_US
dc.contributor.author	LIN CHIA-SHUI	en_US
dc.date.accessioned	2014-12-13T10:34:46Z	-
dc.date.available	2014-12-13T10:34:46Z	-
dc.date.issued	2002	en_US
dc.identifier.govdoc	NSC91-2212-E009-055	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/92965	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=818538&docId=154885	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	電漿蝕刻製程的先進製程控制	zh_TW
dc.title	Advanced Process Control of Plasma Etching Process	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學機械工程系	zh_TW
Appears in Collections:	Research Plans

Files in This Item:

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.