| 標題: | 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫II:BST 介電薄膜在12吋矽晶圓上快速熱回火製程中熱物理性質及熱應力之研究(III) Study on the Thermal Properties and Stresses of a 12-Inches Silicon Wafer with High-Dielectric BST Thin Films in Rapid Thermal Processing/Annealing(III) |
| 作者: | 曲新生 CHU, HSIN-SEN 交通大學機械工程研究所 |
| 公開日期: | 2002 |
| 官方說明文件#: | NSC91-2212-E009-040 |
| URI: | http://hdl.handle.net/11536/93005 https://www.grb.gov.tw/search/planDetail?id=783005&docId=150398 |
| Appears in Collections: | Research Plans |
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