標題: 193奈米微影解像度增進技術---高透射率嵌附層之研製、應用探討與模擬
193 nm Resolution Enhancement Techniques---Fabrication, Application Study and Simulation of High Transmittance Embedded Layers
作者: 龍文安
Loong Wen-an
交通大學應用化學系
公開日期: 2002
官方說明文件#: NSC91-2215-E009-064
URI: http://hdl.handle.net/11536/93058
https://www.grb.gov.tw/search/planDetail?id=784474&docId=150790
Appears in Collections:Research Plans