完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 林清發 | en_US |
| dc.contributor.author | LIN TSING-FA | en_US |
| dc.date.accessioned | 2014-12-13T10:35:37Z | - |
| dc.date.available | 2014-12-13T10:35:37Z | - |
| dc.date.issued | 2001 | en_US |
| dc.identifier.govdoc | NSC90-2212-E009-077 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/93517 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=662734&docId=125585 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 矽晶圓 | zh_TW |
| dc.subject | 化學氣相沉積法 | zh_TW |
| dc.subject | 薄膜成長 | zh_TW |
| dc.subject | 進氣系統 | zh_TW |
| dc.subject | Silicon wafer | en_US |
| dc.subject | Chemical vapor deposition (CVD) | en_US |
| dc.subject | Thin film growth | en_US |
| dc.subject | Gas feeding system | en_US |
| dc.title | 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫Ⅰ：12吋矽晶圓CVD製程設備的加熱及成長BST薄膜之進氣系統設計與反應爐系統整合(II) | zh_TW |
| dc.title | Design of Heating Assembly and Gas Feeding Unit for BST Thin Film Growth and Integration of CVD Reactor System for a 12-inch Single Silicon Wafer (II) | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 國立交通大學機械工程研究所 | zh_TW |
| 顯示於類別： | 研究計畫 | |
