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dc.contributor.author張俊彥en_US
dc.contributor.authorCHANG CHUN-YENen_US
dc.date.accessioned2014-12-13T10:36:41Z-
dc.date.available2014-12-13T10:36:41Z-
dc.date.issued2001en_US
dc.identifier.govdocNSC90-2215-E009-078zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/94109-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=665740&docId=126384en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject低溫zh_TW
dc.subject多晶矽鍺zh_TW
dc.subject薄膜電晶體zh_TW
dc.subject退火製程zh_TW
dc.subjectLow temperatureen_US
dc.subjectPoly SiGeen_US
dc.subjectThin film transistor (TFT)en_US
dc.subjectAnnealing processen_US
dc.title複晶矽鍺與MILC在低溫複晶矽薄膜電晶體上之應用---子計畫III:MILC低溫複晶矽薄膜電晶體之退火製程開發、新穎結構及小尺寸元件之製作及研究(I)zh_TW
dc.titleStudy of Low Temperautre MILC Poly-Si Film and Its Application on Novel Strucutre Small Dimensional TFTs (I)en_US
dc.typePlanen_US
dc.contributor.department國立交通大學電子工程學系zh_TW
顯示於類別:研究計畫