| 標題: | 矽晶圓高效減廢超洗淨技術研究 Ultra-clean for Silicon Wafers with Less Consumption of Water and Chemicals |
| 作者: | 潘扶民 PAN FU-MING 國立交通大學毫微米實驗室 |
| 關鍵字: | 矽晶圓;超洗淨;表面分析;金氧半導體;金屬汙染物;氮化氧化層;Silicon wafer;Ultra-cleaning;Surface analysis;MOS;Metal contaminant;Nitrided oxide |
| 公開日期: | 1999 |
| 官方說明文件#: | NSC88-2215-E317-002 |
| URI: | http://hdl.handle.net/11536/94279 https://www.grb.gov.tw/search/planDetail?id=418270&docId=74205 |
| 顯示於類別： | 研究計畫 |
- Novel one-step aqueous solutions to replace pregate oxide cleans / Pan, TM;Lei, TF;Ko, FH;Chao, TS;Chin, TH
- Novel post CMP cleaning using buffered HF solution and ozone water / Yeh, CF;Hsiao, CW;Lee, WS
- Applications of total reflection X-ray fluorescence to analysis of VLSI micro contamination / Liou, BW;Lee, CL
- Surface Deposition of Ionic Contaminants on Silicon Wafers in a Cleanroom Environment / Lin, I-Kai;Bai, Hsunling;Wu, Bi-Jun
- 動態隨機存取記憶體(DRAM)電容清洗技術之研究 / 吳慧盈;Ng, Wei Yeeng;張立;Chang, Li
- One-step cleaning solution to replace the conventional RCA two-step cleaning recipe for pregate oxide cleaning / Pan, TM;Lei, TF;Chao, TS;Liaw, MC;Ko, FH
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