標題: 利用同步輻射光源對三五族氮化物半導體薄膜之特性研究
Synchrotron Radiation Characterization of III-V Nitride Semiconductor Films
作者: 陳文雄
交通大學電子物理系
關鍵字: 三五族氮化合物;同步輻射光源;X射線吸收的精細結構光譜;X射線駐波;III-V nitride;Synchrotron radiation;X-ray absorption fine structure (XAFS);X-ray standing wave (XSW)
公開日期: 1999
官方說明文件#: NSC88-2112-M009-031
URI: http://hdl.handle.net/11536/94381
https://www.grb.gov.tw/search/planDetail?id=426407&docId=76151
Appears in Collections:Research Plans


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