極平整之超薄氧化層

標題:	極平整之超薄氧化層 Atomically Smooth Ultrathin Oxide
作者:	蔡中交通大學電子工程系
關鍵字:	超薄;氧化層;二氧化矽;半導體;閘極氧化層;Ultrathin;Oxidation layer;SiO2;Semiconductor;Gate oxide
公開日期:	1999
官方說明文件#:	NSC88-2215-E009-033
URI:	http://hdl.handle.net/11536/94456 https://www.grb.gov.tw/search/planDetail?id=444364&docId=80480
Appears in Collections:	Research Plans

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