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dc.contributor.authorChu, Shu-Chunen_US
dc.contributor.authorChern, Jyh-Longen_US
dc.date.accessioned2014-12-08T15:12:18Z-
dc.date.available2014-12-08T15:12:18Z-
dc.date.issued2008-04-15en_US
dc.identifier.issn0030-4018en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.optcom.2007.12.032en_US
dc.identifier.urihttp://hdl.handle.net/11536/9450-
dc.description.abstractIt is proposed and numerically verified that the one-dimensional edge roughness of test sample can be characterized by far-field irradiance measurement at subwavelength-scale precision with a constructed aperture playing as an optical ruler. The precision of the proposed scheme of measurement could be better than 3%, even when the edge roughness is in subwavelength-scale. The influence of sample thickness on the proposed measurement scheme is also investigated and considered. (C) 2007 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectdiffractionen_US
dc.subjectsubwavelengthen_US
dc.subjectmeasurementen_US
dc.titleCharacterization of one-dimension edge roughness from far-field irradiance at subwavelength-scale precisionen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.optcom.2007.12.032en_US
dc.identifier.journalOPTICS COMMUNICATIONSen_US
dc.citation.volume281en_US
dc.citation.issue8en_US
dc.citation.spage1997en_US
dc.citation.epage2001en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000254566000015-
dc.citation.woscount2-
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