| Title: | 製作低溫(450℃)鋁閘極複晶矽薄膜電晶體之相關技術發展---低溫薄膜電晶體之相關薄絕緣層之製備研究(I) The Study on Thin Dielectrics Preparation Technology for Low Temperature TFTs (I) |
| Authors: | 李崇仁 交通大學電子工程系 |
| Keywords: | 複晶矽;薄絕緣層;化學氣相沈積法;電漿加強化學氣相沈積法;快速熱處理;Polysilicon;Thin dielectric;Chemical vapor deposition;Plasma-enhance CVD;Rapid thermal process (RTP) |
| Issue Date: | 1999 |
| Gov't Doc #: | NSC88-2215-E009-054 |
| URI: | http://hdl.handle.net/11536/94527 https://www.grb.gov.tw/search/planDetail?id=444146&docId=80428 |
| Appears in Collections: | Research Plans |
Files in This Item:
If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.
- 低溫薄膜電晶體之相關薄絕緣層之製備研究 / 李崇仁
- Performance and reliability of low-temperature polysilicon TFT with a novel stack gate dielectric and stack optimization using PECVD nitrous oxide plasma / Chang, KM;Yang, WC;Tsai, CP
- 低溫薄膜電晶體之相關薄絕緣層之製備研究(III) / 李崇仁
- High-performance RSD poly-Si TFTs with a new ONO gate dielectric / Chang, KM;Yang, WC;Hung, BF
- 薄絕緣層、複晶矽及相關元件應用之研究(VI) / 李崇仁
Loading...