完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 林鵬 | en_US |
| dc.contributor.author | LIN PANG | en_US |
| dc.date.accessioned | 2014-12-13T10:37:38Z | - |
| dc.date.available | 2014-12-13T10:37:38Z | - |
| dc.date.issued | 1998 | en_US |
| dc.identifier.govdoc | NSC87-2215-E009-073 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/94785 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=409130&docId=72441 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 動態隨機存取記憶體 | zh_TW |
| dc.subject | 介電常數 | zh_TW |
| dc.subject | 薄膜 | zh_TW |
| dc.subject | 電容 | zh_TW |
| dc.subject | 濺鍍 | zh_TW |
| dc.subject | 製程 | zh_TW |
| dc.subject | DRM | en_US |
| dc.subject | Dielectric constant | en_US |
| dc.subject | Thin film | en_US |
| dc.subject | Capacitors | en_US |
| dc.subject | Sputtering | en_US |
| dc.subject | Process | en_US |
| dc.title | 隨機記憶體用高介電薄膜電容之研發 | zh_TW |
| dc.title | High Dielectric Thin Film Capacitor for DRAM | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 交通大學材料科學與工程研究所 | zh_TW |
| 顯示於類別: | 研究計畫 | |

