奈米金屬閘MOS元件製程技術之研發

標題:	奈米金屬閘MOS元件製程技術之研發 Study of Nano Metal Gate MOS Device Technology Fabrication
作者:	葉清發交通大學電子工程系
關鍵字:	奈米結構;金氧半導體元件;金屬閘;積體電路技術;Nanostructure;MOS device;Metal gate;IC technique
公開日期:	2001
官方說明文件#:	NSC90-2215-E009-097
URI:	http://hdl.handle.net/11536/94920 https://www.grb.gov.tw/search/planDetail?id=665793&docId=126396
Appears in Collections:	Research Plans

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