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dc.contributor.author龍文安en_US
dc.contributor.authorLoong Wen-anen_US
dc.date.accessioned2014-12-13T10:38:08Z-
dc.date.available2014-12-13T10:38:08Z-
dc.date.issued1998en_US
dc.identifier.govdocNSC87-2215-E009-056zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/95090-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=409020&docId=72412en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject電子束微影成像zh_TW
dc.subject近距效應zh_TW
dc.subject校正zh_TW
dc.subject參數zh_TW
dc.subjectElectron beam lithographyen_US
dc.subjectProximity effecten_US
dc.subjectCorrectionen_US
dc.subjectParameteren_US
dc.title電子束微影近距效應校正參數求測zh_TW
dc.titleDetermination of Proximity Correction Parameters for Electron Beam Lithographyen_US
dc.typePlanen_US
dc.contributor.department交通大學應用化學系zh_TW
Appears in Collections:Research Plans