電子束微影近距效應校正參數求測

Full metadata record

DC Field	Value	Language
dc.contributor.author	龍文安	en_US
dc.contributor.author	Loong Wen-an	en_US
dc.date.accessioned	2014-12-13T10:38:08Z	-
dc.date.available	2014-12-13T10:38:08Z	-
dc.date.issued	1998	en_US
dc.identifier.govdoc	NSC87-2215-E009-056	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/95090	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=409020&docId=72412	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	電子束微影成像	zh_TW
dc.subject	近距效應	zh_TW
dc.subject	校正	zh_TW
dc.subject	參數	zh_TW
dc.subject	Electron beam lithography	en_US
dc.subject	Proximity effect	en_US
dc.subject	Correction	en_US
dc.subject	Parameter	en_US
dc.title	電子束微影近距效應校正參數求測	zh_TW
dc.title	Determination of Proximity Correction Parameters for Electron Beam Lithography	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學應用化學系	zh_TW
Appears in Collections:	Research Plans