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Title: 8吋矽晶圓半導體LPCVD製程設備之研發---子計畫四：利用LPCVD法成長Ta/sub 2/O/sub 5/薄膜與特性分析(I)
Growth and Characterization of LPCVD Ta/sub 2/O/sub 5/ Thin Films (Ⅰ)
Authors: 曾俊元
TSEUNG-YUENTSENG
交通大學電子工程系
Keywords: 五氧化二鉭;低壓化學蒸鍍法;晶圓;薄膜生長;Tantalum pentaoxide;LPCVD;Wafer;Thin film growth
Issue Date: 1997
Gov't Doc #: NSC86-2221-E009-045
URI: http://hdl.handle.net/11536/95211
https://www.grb.gov.tw/search/planDetail?id=293407&docId=53716
Appears in Collections:Research Plans


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