以UHV/CVD低溫成長複晶薄膜及其金屬矽化物於次微米元件之應用

Full metadata record

DC Field	Value	Language
dc.contributor.author	雷添福	en_US
dc.contributor.author	LEI TAN-FU	en_US
dc.date.accessioned	2014-12-13T10:39:03Z	-
dc.date.available	2014-12-13T10:39:03Z	-
dc.date.issued	1996	en_US
dc.identifier.govdoc	NSC85-2215-E009-051	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/96018	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=218531&docId=38691	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	以UHV/CVD低溫成長複晶薄膜及其金屬矽化物於次微米元件之應用	zh_TW
dc.title	Low Temperature Growth of Polycrystalline Silicon by UHV/CVD and Its Metal Silicide for the Application of Submicron Devices	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學電子工程研究所	zh_TW
Appears in Collections:	Research Plans