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dc.contributor.author陳家富en_US
dc.contributor.authorCHEN CHIA-FUen_US
dc.date.accessioned2014-12-13T10:39:14Z-
dc.date.available2014-12-13T10:39:14Z-
dc.date.issued1996en_US
dc.identifier.govdocNSC85-2216-E009-014zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/96222-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=206895&docId=36556en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject薄膜zh_TW
dc.subject陶瓷zh_TW
dc.subject離子鍍層法zh_TW
dc.subject電漿鍍zh_TW
dc.subjectThin filmen_US
dc.subjectCeramicen_US
dc.subjectIon platingen_US
dc.subjectPlasma depositionen_US
dc.title陶瓷薄膜在核能電廠管路組件與工模具壽命之改善與應用---子計畫II:新AIP法高機能性硬質薄膜之製程與特性研究zh_TW
dc.titleStudy of the Processing and Properties of the New Arc Ion Plating Hard Thin Filmsen_US
dc.typePlanen_US
dc.contributor.department國立交通大學材料科學工程研究所zh_TW
Appears in Collections:Research Plans