Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 陳家富 | en_US |
| dc.contributor.author | CHEN CHIA-FU | en_US |
| dc.date.accessioned | 2014-12-13T10:39:14Z | - |
| dc.date.available | 2014-12-13T10:39:14Z | - |
| dc.date.issued | 1996 | en_US |
| dc.identifier.govdoc | NSC85-2216-E009-014 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/96222 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=206895&docId=36556 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 薄膜 | zh_TW |
| dc.subject | 陶瓷 | zh_TW |
| dc.subject | 離子鍍層法 | zh_TW |
| dc.subject | 電漿鍍 | zh_TW |
| dc.subject | Thin film | en_US |
| dc.subject | Ceramic | en_US |
| dc.subject | Ion plating | en_US |
| dc.subject | Plasma deposition | en_US |
| dc.title | 陶瓷薄膜在核能電廠管路組件與工模具壽命之改善與應用---子計畫II:新AIP法高機能性硬質薄膜之製程與特性研究 | zh_TW |
| dc.title | Study of the Processing and Properties of the New Arc Ion Plating Hard Thin Films | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 國立交通大學材料科學工程研究所 | zh_TW |
| Appears in Collections: | Research Plans | |

