利用電弧離子蒸著法研究高機能性硬質薄膜之製作與評價

Full metadata record

DC Field	Value	Language
dc.contributor.author	陳家富	en_US
dc.contributor.author	CHEN CHIA-FU	en_US
dc.date.accessioned	2014-12-13T10:39:30Z	-
dc.date.available	2014-12-13T10:39:30Z	-
dc.date.issued	1995	en_US
dc.identifier.govdoc	NSC84-2216-E009-019	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/96547	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=198948&docId=34806	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	離子鍍層法	zh_TW
dc.subject	電漿	zh_TW
dc.subject	陶瓷薄膜	zh_TW
dc.subject	電弧離子鍍層法	zh_TW
dc.subject	Ion plating	en_US
dc.subject	Plasma	en_US
dc.subject	Ceramics film	en_US
dc.subject	Arc ion plating	en_US
dc.title	利用電弧離子蒸著法研究高機能性硬質薄膜之製作與評價	zh_TW
dc.title	Preparation and Evaluation of Functional Solid Hard Thin Films by Arc Ion Plating	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學材料科學工程研究所	zh_TW
Appears in Collections:	Research Plans