Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 吳光雄 | en_US |
dc.contributor.author | WU KAUNG-HSIUNG | en_US |
dc.date.accessioned | 2014-12-13T10:40:06Z | - |
dc.date.available | 2014-12-13T10:40:06Z | - |
dc.date.issued | 1994 | en_US |
dc.identifier.govdoc | NSC83-0212-M009-022 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/97152 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=71547&docId=10677 | en_US |
dc.description.abstract | 本研究計畫係延續前兩年所建立之脈衝雷 射製備釔系高溫超導薄膜之技術經驗和具體研 究成果,深入探討薄膜成長之起始狀態,以進一 步達到可控制之超薄超導薄膜成長,並改進薄 膜超導特性和其表面狀態,以便達到製作高溫 超導微波電子元件所須之薄膜品質要求.本計 畫亦將建立大面積□雙面蒸鍍技術□以符合應 用之須求.除了單層薄膜蒸鍍外,我們亦將研製 超導/絕緣/超導和超導/導體/超導之三疊層結 構,以提供適合作精密被動和主動微波元件所 須之薄膜.本研究計畫亦將建立雷射造形系統, 研究雷射造形高溫超導薄膜之技術,並嘗試利 用此方法製備高可靠度之超導微波元件且量測 其物理特性. | zh_TW |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.subject | 脈衝雷射蒸鍍 | zh_TW |
dc.subject | 超導薄膜 | zh_TW |
dc.subject | 雙面蒸鍍 | zh_TW |
dc.subject | 三層膜蒸鍍 | zh_TW |
dc.subject | 雷射造形 | zh_TW |
dc.subject | 超導微波電子元件 | zh_TW |
dc.subject | Pulsed laser deposition | en_US |
dc.subject | Superconducting thin films | en_US |
dc.subject | Double size deposition | en_US |
dc.subject | Trilayer deposition | en_US |
dc.subject | Laser patterning | en_US |
dc.subject | Mircowave electronic devices | en_US |
dc.title | 脈衝雷射蒸鍍和造形高溫超導微波元件之研究 (I) | zh_TW |
dc.title | Study the Pulsed Laser Deposition and Patterning of High Tc Superconducting Thin Films for Mircowave Device Application(I) | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 國立交通大學電子物理研究所 | zh_TW |
Appears in Collections: | Research Plans |