| 標題: | 低壓鑽石薄膜的生長與特性的研究 Studies on Hte Growth and Properties of CVD Diamond Films |
| 作者: | 陳貴賢 KUEI-HSIENCHEN 國立台灣大學凝態科學研究中心 |
| 公開日期: | 1994 |
| 官方說明文件#: | NSC83-0208-M002-054-PC |
| URI: | http://hdl.handle.net/11536/97347 https://www.grb.gov.tw/search/planDetail?id=91115&docId=13816 |
| Appears in Collections: | Research Plans |
- Electrical properties of diamond films grown at low temperature / Chen, CF;Chen, SH;Lin, KM
- 以甲烷與二氧化碳混合氣體合成鑽石膜之光學性質研究 / 呂禎祥;Leu, Jen Shiang;陳家富;Chen Chia Fu
- Diamond deposition on Si (111) and carbon face 6H-SiC (0001) substrates by positively biased pretreatment / Chang, TF;Chang, L
- Growth of diamond nanoplatelets by CVD / Chen, Hou-Guang;Chang, Li;Cho, Shih-Yin;Yan, Jhih-Kun;Lu, Chun-An
- Growth of diamond films with bias during microwave plasma chemical vapor deposition / Lu, CA;Chang, L;Huang, BR
- Stress reduction of (111) homoepitaxial diamond films on nickel-coated substrate / Chiu, Kun-An;Tian, Jr-Sheng;Wu, Yue-Han;Peng, Chun-Yen;Chang, Li
- 化學氣相沉積鑽石之新技術研究 / 張立;CHANG LI
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