完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 張國明 | en_US |
dc.contributor.author | CHANG KOW-MING | en_US |
dc.date.accessioned | 2014-12-13T10:40:59Z | - |
dc.date.available | 2014-12-13T10:40:59Z | - |
dc.date.issued | 2000 | en_US |
dc.identifier.govdoc | NSC89-2215-E009-089 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/98062 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=583835&docId=109692 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.title | 以電子迴旋共振化學氣相沈積技術成長超薄閘極絕緣膜及可靠性之研究(I) | zh_TW |
dc.title | Fabrication and Reliability of Ultra-thin Gate Dielectrics by ECR-CVD Technique(I) | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 國立交通大學電子工程學系 | zh_TW |
顯示於類別: | 研究計畫 |