完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 李崇仁 | en_US |
| dc.date.accessioned | 2014-12-13T10:41:03Z | - |
| dc.date.available | 2014-12-13T10:41:03Z | - |
| dc.date.issued | 2000 | en_US |
| dc.identifier.govdoc | NSC89-2215-E009-030 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/98162 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=542081&docId=99576 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 複晶矽 | zh_TW |
| dc.subject | 薄絕緣層 | zh_TW |
| dc.subject | 薄膜電晶體 | zh_TW |
| dc.subject | 化學氣相沈積法 | zh_TW |
| dc.subject | 低溫快速退火 | zh_TW |
| dc.subject | 準分子雷射 | zh_TW |
| dc.subject | Polysilicon | en_US |
| dc.subject | Thin dielectric film | en_US |
| dc.subject | Thin film transistor | en_US |
| dc.subject | Chemical vapor deposition (CVD) | en_US |
| dc.subject | Rapid thermal process | en_US |
| dc.subject | Excimer laser | en_US |
| dc.title | 低溫薄膜電晶體之相關薄絕緣層之製備研究 | zh_TW |
| dc.title | The Study on Thin Dielectrics Preparation Technology for Low Temperature TFTs | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 交通大學電子工程系 | zh_TW |
| 顯示於類別： | 研究計畫 | |
