Run-by-run process control of metal sputter deposition: Combining time series and extended kalman filter

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000248669800013.pdf (510.2 KB)

Date

Authors

Chen, Juhn-Horng

DOI

10.1109/TSM.2007.901392

Keywords

d-EWMA controller , deposition rate , extended Kalman filter , time series model , time-varying d-EWMA controller

URI

http://dx.doi.org/10.1109/TSM.2007.901392
https://ir.lib.nycu.edu.tw/handle/11536/10497

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