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Showing results 1 to 19 of 19
Issue DateTitleAuthor(s)
1-Feb-19950.35-MU-M PATTERN FABRICATION USING QUARTZ-ETCH ATTENUATE PHASE-SHIFTING MASK IN AN I-LINE STEPPER WITH A 0.50-NA AND A 0.60-SIGMALOONG, WA; SHY, SL; LIN, YC; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-Jan-1994CROSS SHAPED PATTERN ON CHROME MASK FOR 0.5 MU-M CONTACT HOLE FABRICATIONLOONG, WA; SHY, SL; GUO, GC; YANG, MT; SU, SY; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-Nov-1990A DIRECT APPROACH TO THE MODELING OF POLYDIHEXYLSILANE AS A CONTRAST ENHANCEMENT MATERIALLOONG, WA; PAN, HT; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-Apr-1993ENHANCED O2 PLASMA STRIPPING OF P+ AND SI+ IMPLANTED NEGATIVE RESIST BY H2 PLASMA PRETREATMENTLOONG, WA; YEN, MS; WANG, FC; HSU, BY; LIU, YL; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
6-Jun-1991ENHANCED OXYGEN PLASMA STRIPPING OF P+-IMPLANTED NEGATIVE RESIST BY HYDROGEN PLASMA PRETREATMENT - TEMPERATURE EFFECTSLOONG, WA; YEN, MS; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-Mar-1991ENHANCED OXYGEN REACTIVE ION ETCHING RESISTANCE OF DIAZONAPHTHOQUINONE-POLY (FORMYLOXYSTYRENE) RESIST SYSTEM BY PHOTOACID CATALYZED PHOTO-FRIES REARRANGEMENT AND POTASSIUM-ION TREATMENT IN AQUEOUS-SOLUTIONLOONG, WA; SU, AN; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
14-Mar-1991ENHANCEMENT OF CF4 AND O2 REACTIVE ION ETCHING RESISTANCE OF POLY(BUTENE-1 SULFONE) BY N2 PLASMA PRETREATMENTLOONG, WA; CHANG, HW; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-Mar-1991KEV ION-BEAM-EXPOSED POLY(METHYLISOPROPENYLKETONE) AND POLY(PHENYLISOPROPENYLKETONE)LOONG, WA; PENG, NT; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-Mar-1991THE MODELING AND SIMULATION OF NONLINEAR PHOTOBLEACHING MATERIALSLOONG, WA; PAN, HT; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
15-Jul-1991OXIDATION OF GAAS SURFACE BY OXYGEN PLASMA AND ITS APPLICATION AS AN ANTIREFLECTION LAYERLOONG, WA; CHANG, HL; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-May-1991PHOTOACID CATALYZED MAIN CHAIN SCISSION OF POLY(BUTENE-1 SULFONE) AS A DEEP UV POSITIVE RESISTLOONG, WA; CHANG, HW; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1990PHOTOACID CATALYZED PHOTO-FRIES REARRANGEMENTS OF POLY(PARA-FORMYLOXYSTYRENE) AND FORMYLOXYNOVOLACLOONG, WA; CHEN, RH; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-Aug-1992POLY(DIMETHYL-CO-DIPHENYLSILANE) AS A DEEP-UV AND AN OXYGEN PLASMA PORTABLE CONFORMABLE MASKLOONG, WA; WANG, TH; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
9-Apr-1989POLY(FORMYLOXYSTYRENE) AS LIFT-OFF RESISTLOONG, WA; HONG, WM; 應用化學系; Department of Applied Chemistry
1-Sep-1991PROCESSES OF TOP-IMAGED SINGLE-LAYER RESISTS BY POTASSIUM-ION TREATMENT IN SOLUTIONLOONG, WA; SU, AN; WANG, JL; CHU, CY; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1994SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIMLOONG, WA; SHY, SL; GUO, GC; CHOU, YL; 應用化學系; Department of Applied Chemistry
1-Sep-1991THE SIMULATION OF CONTRAST-ENHANCED LITHOGRAPHYLOONG, WA; PAN, HT; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1995SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIMLOONG, WA; YEH, CH; SHY, SL; 應用化學系; Department of Applied Chemistry
1-Dec-1991TITANIUM MONONITRIDE AS AN ANTIREFLECTION LAYER ON ALUMINUM METALLIZATION FOR SUBMICRON PHOTOLITHOGRAPHIC PATTERNINGLOONG, WA; CHIU, KD; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
Showing results 1 to 19 of 19