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1-七月-2011Amorphous-Layer Regrowth and Activation of P and As Implanted Si by Low-Temperature Microwave AnnealingHsueh, Fu-Kuo; Lee, Yao-Jen; Lin, Kun-Lin; Current, Michael I.; Wu, Ching-Yi; Chao, Tien-Sheng; 電子物理學系; Department of Electrophysics
2015High Performance Poly Si Junctionless Transistors with Sub-5nm Conformally Doped Layers by Molecular Monolayer Doping and Microwave Incorporating CO2 Laser Annealing for 3D Stacked ICs ApplicationsLee, Yao-Jen; Cho, Ta-Chun; Sung, Po-Jung; Kao, Kuo-Hsing; Hsueh, Fu-Kuo; Hou, Fu-Ju; Chen, Po-Cheng; Chen, Hsiu-Chih; Wu, Chien-Ting; Hsu, Shu-Han; Chen, Yi-Ju; Huang, Yao-Ming; Hou, Yun-Fang; Huang, Wen-Hsien; Yang, Chih-Chao; Chen, Bo-Yuan; Lin, Kun-Lin; Chen, Min-Cheng; Shen, Chang-Hong; Huang, Guo-Wei; Huang, Kun-Ping; Current, Michael I.; Li, Yiming; Samukawa, Seiji; Wu, Wen-Fa; Shieh, Jia-Min; Chao, Tien-Sheng; Yeh, Wen-Kuan; 電子物理學系; 電機學院; Department of Electrophysics; College of Electrical and Computer Engineering
1-五月-2017High-Performance Uniaxial Tensile Strained n-Channel JL SOI FETs and Triangular JL Bulk FinFETs for Nanoscaled ApplicationsSung, Po-Jung; Cho, Ta-Chun; Hou, Fu-Ju; Hsueh, Fu-Kuo; Chung, Sheng-Ti; Lee, Yao-Jen; Current, Michael I.; Chao, Tien-Sheng; 電子物理學系; Department of Electrophysics
1-十月-2013Low-Temperature Microwave Annealing for MOSFETs With High-k/Metal Gate StacksLee, Yao-Jen; Tsai, Bo-An; Lai, Chiung-Hui; Chen, Zheng-Yao; Hsueh, Fu-Kuo; Sung, Po-Jung; Current, Michael I.; Luo, Chih-Wei; 電子物理學系; Department of Electrophysics
1-三月-2014Low-Temperature Microwave Annealing Processes for Future IC Fabrication-A ReviewLee, Yao-Jen; Cho, Ta-Chun; Chuang, Shang-Shiun; Hsueh, Fu-Kuo; Lu, Yu-Lun; Sung, Po-Jung; Chen, Hsiu-Chih; Current, Michael I.; Tseng, Tseung-Yuen; Chao, Tien-Sheng; Hu, Chenming; Yang, Fu-Liang; 電子物理學系; 電子工程學系及電子研究所; Department of Electrophysics; Department of Electronics Engineering and Institute of Electronics
2012Microwave AnnealingLee, Yao-Jen; Cho, T. -C.; Chuang, S. -S.; Hsueh, F. -K.; Lu, Y. -L.; Sung, J.; Chen, S. -J.; Lo, C. -H.; Lai, C. -H.; Current, Michael I.; Tseng, T. -Y.; Chao, T. -S.; Yang, F. -L.; 電子物理學系; 電子工程學系及電子研究所; Department of Electrophysics; Department of Electronics Engineering and Institute of Electronics
2013Microwave Annealing of Phosphorus and Cluster Carbon Implanted (100) and (110) SiCho, Ta-Chun; Lu, Yu-Lun; Yao, Jie-Yi; Lee, Yao-Jen; Sekar, Karuppanan; Tokoro, Nobuhiro; Onoda, Hiroshi; Krull, Wade; Current, Michael I.; Chao, Tien-Sheng; 電子物理學系; Department of Electrophysics
1-二月-2012Susceptor Coupling for the Uniformity and Dopant Activation Efficiency in Implanted Si Under Fixed-Frequency Microwave AnnealLee, Yao-Jen; Hsueh, Fu-Kuo; Current, Michael I.; Wu, Ching-Yi; Chao, Tien-Sheng; 電子物理學系; Department of Electrophysics
1-一月-2017Ultra-Shallow Junction Formation by Monolayer Doping Process in Single Crystalline Si and Ge for Future CMOS DevicesChuang, Shang-Shiun; Cho, Ta-Chun; Sung, Po-Jung; Kao, Kuo-Hsing; Chen, Henry J. H.; Lee, Yao-Jen; Current, Michael I.; Tseng, Tseung-Yuen; 電子物理學系; 電子工程學系及電子研究所; Department of Electrophysics; Department of Electronics Engineering and Institute of Electronics
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