1. 目前位置：

瀏覽 的方式： 作者 Liu, C

跳到： 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
或是輸入前幾個字：  
顯示 1 到 11 筆資料，總共 11 筆
公開日期標題作者
1-十一月-1998Application of plasma immersion ion implantation doping to low-temperature processed poly-Si TFT'sYeh, CF; Chen, TJ; Liu, C; Shao, JQ; Cheung, NW; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
31-十月-1997Chemical-mechanical polishing of low-dielectric-constant spin-on-glasses: film chemistries, slurry formulation and polish selectivityWang, YL; Liu, C; Chang, ST; Tsai, MS; Feng, MS; Tseng, WT; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
31-十月-1997Effects of corrosion environments on the surface finishing of copper chemical mechanical polishingWang, MT; Tsai, MS; Liu, C; Tseng, WT; Chang, TC; Chen, LJ; Cheng, MC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
31-十月-1997Effects of underlying films on the chemical-mechanical polishing for shallow trench isolation technologyWang, YL; Liu, C; Feng, MS; Dun, JW; Chou, KS; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
1-一月-1998The exothermic reaction and temperature measurement for tungsten CMP technology and its application on endpoint detectionWang, YL; Liu, C; Feng, MS; Tseng, WT; 材料科學與工程學系; Department of Materials Science and Engineering
1-一月-1998The exothermic reaction and temperature measurement for tungsten CMP technology and its application on endpoint detectionWang, YL; Liu, C; Feng, MS; Tseng, WT; 材料科學與工程學系; Department of Materials Science and Engineering
1998Highly reliable liquid-phase deposited SiO2 with nitrous oxide plasma post-treatment for low temperature processed poly-Si TFT'sYeh, CF; Chen, DC; Lu, CY; Liu, C; Lee, ST; Liu, CH; Chen, TJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十月-2002Highly reliable liquid-phase-deposited SiO2 with nitrous oxide plasma post-treatment for low-temperature-processed polysilicon thin film transistorsYeh, CF; Chen, DCH; Lu, CY; Liu, C; Lee, ST; Liu, CH; Chen, TJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-五月-1999Hydrogenation of polysilicon thin-film transistor in a planar inductive H-2/Ar dischargeYeh, CF; Chen, TJ; Liu, C; Gudmundsson, JT; Lieberman, MA; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-一月-1998A modified multi-chemicals spray cleaning process for post-CMP cleaning applicationWang, YL; Liu, C; Feng, MS; Tseng, WT; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
1-一月-1998A modified multi-chemicals spray cleaning process for post-CMP cleaning applicationWang, YL; Liu, C; Feng, MS; Tseng, WT; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
顯示 1 到 11 筆資料，總共 11 筆