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顯示 1 到 16 筆資料，總共 16 筆
公開日期標題作者
1-五月-2001Characterization of ultrathin oxynitride (18-21 angstrom) gate dielectrics by NH3 nitridation and N2O RTA treatmentPan, TM; Lei, TF; Wen, HC; Chao, TS; 電子工程學系及電子研究所; 奈米中心; Department of Electronics Engineering and Institute of Electronics; Nano Facility Center
1-十一月-2001Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si filmPan, TM; Lei, TF; Ko, FH; Chao, TS; Chiu, TH; Lee, YH; Lu, CP; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
15-三月-2001Comparison of ultrathin CoTiO3 and NiTiO3 high-k gate dielectricsPan, TM; Lei, TF; Chao, TS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2005Effects of metallic contaminants on the electrical characteristics of ultrathin gate oxidesPan, TM; Ko, FH; Chao, TS; Chen, CC; Chang-Liao, KS; 材料科學與工程學系奈米科技碩博班; 電子物理學系; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Electrophysics
1-九月-2001Electrical characteristics of thin cerium oxide film on silicon substrate by reactive DC sputteringPan, TM; Chien, CH; Lei, TF; Chao, TS; Huang, TY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-七月-2001High quality interpoly dielectrics deposited on the nitrided-polysilicon for nonvolatile memory devicesYang, WL; Chao, TS; Cheng, CM; Pan, TM; Lei, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-二月-2001High quality interpoly-oxynitride grown by NH3 nitridation and N2O RTA treatmentPan, TM; Lei, TF; Yang, WL; Cheng, CM; Chao, TS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-九月-2000High quality ultrathin CoTiO3 high-k gate dielectricsPan, TM; Lei, TF; Chao, TS; Chang, KL; Hsieh, KC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
5-三月-2001High-k cobalt-titanium oxide dielectrics formed by oxidation of sputtered Co/Ti or Ti/Co filmsPan, TM; Lei, TF; Chao, TS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-七月-2000Novel cleaning solutions for polysilicon film post chemical mechanical polishingPan, TM; Lei, TF; Chen, CC; Chao, TS; Liaw, MC; Yang, WL; Tsai, MS; Lu, CP; Chang, WH; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-八月-2004Novel one-step aqueous solutions to replace pregate oxide cleansPan, TM; Lei, TF; Ko, FH; Chao, TS; Chin, TH; Lu, CP; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-六月-2001One-step cleaning solution to replace the conventional RCA two-step cleaning recipe for pregate oxide cleaningPan, TM; Lei, TF; Chao, TS; Liaw, MC; Ko, FH; Lu, CP; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-九月-2003A one-step single-cleaning solution for CMOS processesChao, TS; Yeh, CH; Pan, TM; Lei, TF; Li, YH; 電子物理學系; 電子工程學系及電子研究所; Department of Electrophysics; Department of Electronics Engineering and Institute of Electronics
1-十月-2000Optimum conditions for novel one-step cleaning method for pre-gate oxide cleaning using robust design methodologyPan, TM; Lei, TF; Chao, TS; Liaw, MC; Lu, CP; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-六月-2002Performance evaluation of cleaning solutions enhanced with tetraalkylammonium hydroxide substituents for post-CMP cleaning on poly-Si filmPan, TM; Lei, TF; Ko, FH; Chao, TS; Liaw, MC; Lee, YH; Lu, CP; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-八月-2000Robust ultrathin oxynitride dielectrics by NH3 nitridation and N2O RTA treatmentPan, TM; Lei, TF; Chao, TS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
顯示 1 到 16 筆資料，總共 16 筆