| 標題: | 極紫外光(EUV)微影技術從光源建造、光罩、材料、製程到奈米元件可靠度研究(II) Investigations on Extreme Ultraviolet Lithography (Euvl) from Beamline Construction, Masks, Materials, Processes, to Reliability of Nano Devices (II) |
| 作者: | 黃遠東 HUANG YANG-TUNG 國立交通大學電子工程學系及電子研究所 |
| 公開日期: | 2009 |
| 官方說明文件#: | NSC98-2120-M009-007 |
| URI: | http://hdl.handle.net/11536/101605 https://www.grb.gov.tw/search/planDetail?id=1888371&docId=312332 |
| Appears in Collections: | Research Plans |
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