化學機械研磨在氧化鋁及氮化鎵上的應用研究

標題:	化學機械研磨在氧化鋁及氮化鎵上的應用研究 The Application Research of Chemical Mechanical Polished on Al/sub 2/O/sub 3/ and GaN
作者:	施敏 SZE SIMON MIN 交通大學電子工程系
關鍵字:	化學機械研磨;氮化鎵;單晶基板;Chemical mechanical polish;GaN;Single crystal substrate
公開日期:	2000
官方說明文件#:	NSC89-2215-E009-039
URI:	http://hdl.handle.net/11536/101637 https://www.grb.gov.tw/search/planDetail?id=542138&docId=99592
Appears in Collections:	Research Plans

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