标题: 后次微米时代新兴电子设计自动化技术之研究---总计画(I)
Emerging EDA Technologies beyond DSM Era
作者: 周景扬
JOU JING-YANG
国立交通大学电子工程学系及电子研究所
关键字: 深次微米;电子设计自动化;多时脉周期通讯;高阶合成;耗电管理;节能设计;矽晶片除错;除错化设计;软性错误;计算智能;可制造性设计;多余贯穿点;Deep Submicron;Electronics Design Automation;Muti-CycleCommunication;High-Level Synthesis;Power Management;Low Power Design;Silicon Debug;Design for Debug;Soft Error;Computational Intelligence;Design forManufacturability;Redundant Via
公开日期: 2008
摘要: 半导体元件尺寸随着制程的持续进步而逐年缩小,可整合于单一晶片上的电晶体數
量也因此增加,让当今的电子产品得已提供更多、更复杂的功能。然而,在进入深次微
米时代后,制程上的变異及物理效应对于晶片的影响也愈來愈显着,使得晶片设计面臨
许多新的挑战,在设计的各个环节上更需重视先进制程可能发生的问题,方能提升晶片
的品质及可制造性。
本计画针对设计深次微米时代所需的技术,以分项方式个别研发新兴电子设计自动
化软体,总计画则以协调各子计画的相关成果,整合为一由上而下之完整解决方案。所
涵盖之六项子计画如下:符合次世代晶片上通讯思维之具备几何考量的系统架构合成技
术(子计画一)、整合性低耗电管理之技术开发(子计画二)、角落错误之矽除错(子计画
三)、应用计算智慧推理处理后深次微米时代电路设计上的可靠度挑战(子计画四)、考虑
可制造化、可靠度与良率的绕线系统(子计画五)、及后布局阶段贯穿点及导线良率改善
技术之研究(子计画六)。这些完整而深入的技术开发,预期可以适切地解决这些深次微
米时代所衍生的问题,同时提高国内半导体相关产业之竞争力。
As semiconductor devices shrink with the advancing process technology, more
and more transistors can be integrated in a single chip. It makes modern electronic
products provide much more functionalities, and increases the complexity to design a
chip as well. In addition, the impact of process variation during manufacturing and
other physical effects become more and more significant and non-negligible in the era
of deep submicron (DSM). New challenges and new design issues arise along with the
DSM. Therefore designers must resolve these issues by considering all design stages
simultaneously to increase the quality and manufacturability of chips.
Because the DSM issues and targets of different design levels are quite diverse,
this project considers the overall design flow and divides it into six major topics for
advanced research: (1) Geometry-Aware Architecture Synthesis for Next-Generation
On-Chip Communication Paradigm, (2) Integrated Low Power Management
Technologies, (3) Silicon Debug for Hard-Corner Design Errors, (4) Coping with
Reliability Challenges to Circuit Designs beyond Deep Sub-Micron Era by
Computational Intelligence Reasoning, (5) Manufacturability, Reliability, and
Yield-Aware Routing System, and (6) Yield-Preferred Redundant Via and Wire
Insertion with Critical Area Analysis in Post-Layout Stage. The ultimate goal of this
project is to integrate these emerging EDA technologies as a complete top-down
solution. The techniques developed by these proposed sub-projects will efficiently
solve the DSM issues. Furthermore, with the benefit of better design quality and faster
design process, the domestic semiconductor related industry will have better
competitiveness.
官方说明文件#: NSC97-2220-E009-031
URI: http://hdl.handle.net/11536/102509
https://www.grb.gov.tw/search/planDetail?id=1688357&docId=291156
显示于类别:Research Plans