| 標題: | 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫二：BST 介電薄膜在12吋矽晶圓上快速熱回火製程中熱物理性質及熱應力之研究(II) Study on the Thermal Properties and Stresses of a 12-inches Silicon Wafer with High-dielectric BST Thin Films in Rapid Thermal Processing/Annealing(II) |
| 作者: | 曲新生 CHU, HSIN-SEN 國立交通大學機械工程研究所 |
| 公開日期: | 2000 |
| 官方說明文件#: | NSC89-2212-E009-080 |
| URI: | http://hdl.handle.net/11536/102980 https://www.grb.gov.tw/search/planDetail?id=549699&docId=101498 |
| Appears in Collections: | Research Plans |
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