Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 林清發 | en_US |
| dc.contributor.author | LIN TSING-FA | en_US |
| dc.date.accessioned | 2014-12-13T10:52:03Z | - |
| dc.date.available | 2014-12-13T10:52:03Z | - |
| dc.date.issued | 2000 | en_US |
| dc.identifier.govdoc | NSC89-2212-E009-037 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/103100 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=501199&docId=90359 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | CVD反應爐 | zh_TW |
| dc.subject | 薄膜成長 | zh_TW |
| dc.subject | 熱流設計 | zh_TW |
| dc.subject | 矽晶圓 | zh_TW |
| dc.subject | CVD reactor | en_US |
| dc.subject | Thin film growth | en_US |
| dc.subject | Thermel fluid design | en_US |
| dc.subject | Silicon wafer | en_US |
| dc.title | 12吋矽晶圓半導體VCD製程設備及BST介電薄膜成長研究---總計畫(I) | zh_TW |
| dc.title | Research and Development of CVD Process Equipment for a 12-Inch Single Silicon Wafer and Growth of BST Dielectric Thin Film (I) | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 交通大學機械工程系 | zh_TW |
| Appears in Collections: | Research Plans | |
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