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dc.contributor.authorLiu Po-Tsunen_US
dc.contributor.authorFan Yang-Shunen_US
dc.date.accessioned2014-12-16T06:13:53Z-
dc.date.available2014-12-16T06:13:53Z-
dc.date.issued2014-03-18en_US
dc.identifier.govdocH01L021/20zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/104401-
dc.description.abstractA manufacturing method for manufacturing a flexible non-volatile memory is provided. The manufacturing method comprises the steps outlined below. A flexible substrate is provided. A planarization layer is formed on the flexible substrate. A metal bottom electrode layer is deposited on the planarization layer. A mask is formed to define a plurality of patterns. An AZTO layer having a plurality of electrically independent AZTO cells is deposited on the metal bottom electrode layer corresponding to the patterns. A top electrode layer is deposited on the AZTO layer corresponding to the AZTO cells to form a plurality of non-volatile memory cells.zh_TW
dc.language.isozh_TWen_US
dc.titleFlexible non-volatile memoryzh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber08673727zh_TW
Appears in Collections:Patents


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