| 標題: | RESISTIVE RANDOM ACCESS MEMORY (RRAM) USING STACKED DIELECTRICS AND METHOD FOR MANUFACTURING THE SAME |
| 作者: | Chin Albert Cheng Chun-Hu |
| 公開日期: | 23-May-2013 |
| 摘要: | Resistive random access memory (RRAM) using stacked dielectrics and a method for manufacturing the same are disclosed, where a setting power of only 4 μW, an ultra-low reset power of 2 nW, good switching uniformity and excellent cycling endurance up to 5×109 cycles were achieved simultaneously. Such record high performances were reached in a Ni/GeOx/nano-crystal-TiO2/TaON/TaN RRAM device, where the excellent endurance is 4˜6 orders of magnitude larger than existing Flash memory. The very long endurance and low switching energy RRAM is not only satisfactory for portable SSD in a computer, but may also create new applications such as being used for a Data Center to replace high power consumption hard discs. |
| 官方說明文件#: | H01L045/00 H01L021/8239 B82Y099/00 B82Y030/00 |
| URI: | http://hdl.handle.net/11536/105048 |
| 專利國: | USA |
| 專利號碼: | 20130126818 |
| Appears in Collections: | Patents |
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