標題: RESISTIVE RANDOM ACCESS MEMORY (RRAM) USING STACKED DIELECTRICS AND METHOD FOR MANUFACTURING THE SAME
作者: Chin Albert
Cheng Chun-Hu
公開日期: 23-May-2013
摘要: Resistive random access memory (RRAM) using stacked dielectrics and a method for manufacturing the same are disclosed, where a setting power of only 4 μW, an ultra-low reset power of 2 nW, good switching uniformity and excellent cycling endurance up to 5×109 cycles were achieved simultaneously. Such record high performances were reached in a Ni/GeOx/nano-crystal-TiO2/TaON/TaN RRAM device, where the excellent endurance is 4˜6 orders of magnitude larger than existing Flash memory. The very long endurance and low switching energy RRAM is not only satisfactory for portable SSD in a computer, but may also create new applications such as being used for a Data Center to replace high power consumption hard discs.
官方說明文件#: H01L045/00
H01L021/8239
B82Y099/00
B82Y030/00
URI: http://hdl.handle.net/11536/105048
專利國: USA
專利號碼: 20130126818
Appears in Collections:Patents


文件中的檔案:

  1. 20130126818.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.