| 標題: | 半導體奈米技術 Nanometer technology for semiconductor |
| 作者: | 龍文安 |
| 公開日期: | 2010 |
| 出版社: | 五南 |
| URI: | http://webpac.lib.nctu.edu.tw/F/?func=item-global&doc_library=TOP01&doc_number=005188177 http://hdl.handle.net/11536/106967 |
| ISBN: | 9789571159362 |
| Appears in Collections: | Books |
- Method for fabricating nanometer gate in semiconductor device using thermally reflowed resist technology / Edward, Chang;Huang-Ming, Lee
- Method for fabricating nanometer gate in semiconductor device using thermally reflowed resist technology / Chang;Edward Y.;Lee;Huang-Ming
- 應用Bass模型探討半導體製程技術進展與採用之落差 / 陳緯達;Wei-Ta Chen;虞孝成;Hsiao-Cheng Yu
- The Floating-Gate Non-Volatile Semiconductor Memory-From Invention to the Digital Age / Sze, S. M.
- Zero-phonon lines in the spectra of dysprosium atoms in superfluid helium / Moroshkin, P.;Konol, K.
- 奈米世代MOSFET關鍵製程技術之研發(III) / 葉清發
Loading...