| 標題: | High-temperature leakage improvement in metal-insulator-metal capacitors by work-function tuning |
| 作者: | Chiang, K. C. Cheng, C. H. Pan, H. C. Hsiao, N. Chou, C. P. Chin, Albert Hwang, H. L. 機械工程學系 電子工程學系及電子研究所 Department of Mechanical Engineering Department of Electronics Engineering and Institute of Electronics |
| 關鍵字: | capacitor;high temperature;metal-insulator-metal (MIM);Ni;thermal leakage |
| 公開日期: | 1-Mar-2007 |
| 摘要: | Using low-cost and high work-function Ni, a low leakage current of 5 x 10(-6) A/cm(2) at 125 degrees C is obtained in a high 25-fF/mu m(2)-density SrTiO3 metal-insulator-metal (MIM) capacitor processed at 400 degrees C. This is approximately two orders of magnitude better than the same device using a TaN electrode, with added advantages of improved voltage and temperature coefficients of capacitance. This work-function tuning method also has merit for achieving both low thermal leakage and high overall k value beyond previous laminate structure. |
| URI: | http://dx.doi.org/10.1109/LED.2007.891265 http://hdl.handle.net/11536/11074 |
| ISSN: | 0741-3106 |
| DOI: | 10.1109/LED.2007.891265 |
| 期刊: | IEEE ELECTRON DEVICE LETTERS |
| Volume: | 28 |
| Issue: | 3 |
| 起始頁: | 235 |
| 結束頁: | 237 |
| Appears in Collections: | Articles |
Files in This Item:
If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.
- MIM電容結構下電極材料特性與漏電流關係之研究 / 毛智仁;Chih Jen Mao;張翼;Edward Yi Chang
- Improvement of the performance of TiHfO MIM capacitors by using a dual plasma treatment of the lower electrode / Cheng, C. H.;Pan, H. C.;Huang, C. C.;Chou, C. P.;Hsiao, C. N.
- Improved high-temperature leakage in high-density MIM capacitors by using a TiLaO dielectric and an Ir electrode / Cheng, C. H.;Pan, H. C.;Yang, H. J.;Hsiao, C. N.;Chou, C. P.
- Use of a high-work-function ni electrode to improve the stress reliability of Analog SrTiO3 metal-insulator-metal capacitors / Chiang, K. C.;Cheng, C. H.;Jhou, K. Y.;Pan, H. C.;Hsiao, C. N.
Loading...