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dc.contributor.authorHsiao, Yuan-Wenen_US
dc.contributor.authorKer, Ming-Douen_US
dc.date.accessioned2014-12-08T15:15:10Z-
dc.date.available2014-12-08T15:15:10Z-
dc.date.issued2007-01-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2006.887631en_US
dc.identifier.urihttp://hdl.handle.net/11536/11396-
dc.description.abstractA new bond pad structure in CMOS technology with low capacitance for gigahertz radio frequency applications is proposed. Three kinds of inductors stacked under the pad are used in the proposed bond pad structure. Experimental results have verified that the bond pad capacitance is reduced due to the cancellation effect provided by the inductor embedded in the proposed bond pad structure. The new proposed bond pad structure is fully process-compatible to general CMOS processes without any extra process modification.en_US
dc.language.isoen_USen_US
dc.subjectbond paden_US
dc.subjectcapacitanceen_US
dc.subjectlossen_US
dc.subjectradio frequency integrated circuit (RF IC)en_US
dc.titleBond pad design with low capacitance in CMOS technology for RF applicationsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2006.887631en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume28en_US
dc.citation.issue1en_US
dc.citation.spage68en_US
dc.citation.epage70en_US
dc.contributor.department電機學院zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000243280900023-
dc.citation.woscount0-
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