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dc.contributor.authorLee, Chien-Pingen_US
dc.contributor.authorChati, Frank H. E.en_US
dc.contributor.authorMa, Wenlongen_US
dc.contributor.authorWang, Nanlei Larryen_US
dc.date.accessioned2014-12-08T15:15:28Z-
dc.date.available2014-12-08T15:15:28Z-
dc.date.issued2006-11-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2006.884075en_US
dc.identifier.urihttp://hdl.handle.net/11536/11576-
dc.description.abstractThe safe operating area (SOA) of GaAs-based heterojunction bipolar transistors has been studied considering both the self-heating effect and the breakdown effect. The Kirk effect induced breakdown (KIB) was considered to account for the decrease of the breakdown voltage at high currents. With reasonable emitter ballastors, the RIB effect was shown to be the major cause for device failure at high currents, while the thermal effect controls the low current failure. The effect of emitter resistance and base resistance on device stability was also studied. While the emitter resistance always improves the device stability by expanding the SOAs, the base resistance degrades SOAs when the KIB dominates the failure mechanism. The effect of the base resistance on SOAs was explained by its control on the flow of the avalanche current. Since the KIB effect depends on the collector structure, it was shown that a noniuniformly doped collector can effectively improve the SOAs.en_US
dc.language.isoen_USen_US
dc.subjectGaAsen_US
dc.subjectheterojunction bipolar transistor (HBT)en_US
dc.subjectKirk effecten_US
dc.subjectsafe operating area (SOA)en_US
dc.subjectself-heatingen_US
dc.titleThe safe operating area of GaAs-based heterojunction bipolar transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2006.884075en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume53en_US
dc.citation.issue11en_US
dc.citation.spage2681en_US
dc.citation.epage2688en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000241805300002-
dc.citation.woscount13-
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