標題: Electric stress effect on DC-RF performance degradation of 0.18-mu m mosfets
作者: Chen, C. C.
Kao, H. L.
Chin, Albert
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: stress;I-V;current gain;S parameters;NFmin
公開日期: 1-十月-2006
摘要: We have studied the electric stress effect on DC-RF performance degradation of 64 gate fingers 0.18-mu m RF MOSFETs. The fresh devices show good transistor's DC to RF characteristics of small sub-threshold swing of 85 mV/dec, large drive current (I-d,I-sat) of 500 mu A/mu m, high unity-gain cut-off frequency (f(t)) of 47 GHz, and low minimum not. se figure (NFmin) of 1.3 dB at 10 GHz. The hot carrier stress for 20% I-d,I-sat reduction causes DC g(m) and r(o) degradation as well as the lower RF current gain by 2.35 dB, f(t) reduction to 35.7 GHz, increasing NFmin to 1.7 dB at 10 GHz and poor output impedance matching. (C) 2006 Wiley Periodicals, Inc.
URI: http://dx.doi.org/10.1002/mop.21813
http://hdl.handle.net/11536/11705
ISSN: 0895-2477
DOI: 10.1002/mop.21813
期刊: MICROWAVE AND OPTICAL TECHNOLOGY LETTERS
Volume: 48
Issue: 10
起始頁: 1916
結束頁: 1919
顯示於類別:期刊論文


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