標題: | Electric stress effect on DC-RF performance degradation of 0.18-mu m mosfets |
作者: | Chen, C. C. Kao, H. L. Chin, Albert 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | stress;I-V;current gain;S parameters;NFmin |
公開日期: | 1-Oct-2006 |
摘要: | We have studied the electric stress effect on DC-RF performance degradation of 64 gate fingers 0.18-mu m RF MOSFETs. The fresh devices show good transistor's DC to RF characteristics of small sub-threshold swing of 85 mV/dec, large drive current (I-d,I-sat) of 500 mu A/mu m, high unity-gain cut-off frequency (f(t)) of 47 GHz, and low minimum not. se figure (NFmin) of 1.3 dB at 10 GHz. The hot carrier stress for 20% I-d,I-sat reduction causes DC g(m) and r(o) degradation as well as the lower RF current gain by 2.35 dB, f(t) reduction to 35.7 GHz, increasing NFmin to 1.7 dB at 10 GHz and poor output impedance matching. (C) 2006 Wiley Periodicals, Inc. |
URI: | http://dx.doi.org/10.1002/mop.21813 http://hdl.handle.net/11536/11705 |
ISSN: | 0895-2477 |
DOI: | 10.1002/mop.21813 |
期刊: | MICROWAVE AND OPTICAL TECHNOLOGY LETTERS |
Volume: | 48 |
Issue: | 10 |
起始頁: | 1916 |
結束頁: | 1919 |
Appears in Collections: | Articles |
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