完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Guo, Jyh-Chyurn | en_US |
dc.date.accessioned | 2014-12-08T15:16:10Z | - |
dc.date.available | 2014-12-08T15:16:10Z | - |
dc.date.issued | 2006-08-01 | en_US |
dc.identifier.issn | 0894-6507 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/TSM.2006.879415 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/11994 | - |
dc.description.abstract | Logic CMOS-based RF technology is introduced for a 10-Gb transceiver in which active and passive RF devices have been realized in a single chip. RF nMOS of 115-GHz f(T), 100-GHz f(max), and sub-1.0-dB NFmin at 10 GHz have been fabricated by aggressive device scaling and layout optimization. High-Q MiM capacitor and spiral Cu inductors have been successfully implemented in the same chip by 0.13-mu m low-K/Cu back end of integration line technology. Core 1.0 V MOS and/or junction varactors for VCO at 10 GHz are offerings free of extra cost and realized by the elaborated layout. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | f(max) | en_US |
dc.subject | f(T) | en_US |
dc.subject | inductor | en_US |
dc.subject | MiM capacitor | en_US |
dc.subject | NFmin | en_US |
dc.subject | RF CMOS | en_US |
dc.subject | varactor | en_US |
dc.title | Low-K/Cu CMOS-based SoC technology with 115-GHz f(T), 100-GHz f(max), noise 80-nm RF CMOS, high-Q MiM capacitor, and spiral Cu inductor | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/TSM.2006.879415 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | en_US |
dc.citation.volume | 19 | en_US |
dc.citation.issue | 3 | en_US |
dc.citation.spage | 331 | en_US |
dc.citation.epage | 338 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000239706300006 | - |
dc.citation.woscount | 3 | - |
顯示於類別: | 期刊論文 |